The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 1995

Filed:

Nov. 02, 1992
Applicant:
Inventors:

Paul C Allen, Beaverton, OR (US);

Matthew J Jolley, Beaverton, OR (US);

Robin L Teitzel, Portland, OR (US);

Michael Rieger, Portland, OR (US);

Michael Bohan, Beaverton, OR (US);

Timothy Thomas, Beaverton, OR (US);

Assignee:

Etec Systems, Inc., Beaverton, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J / ;
U.S. Cl.
CPC ...
346108 ;
Abstract

An improved laser pattern generation apparatus. The improved pattern generation apparatus of the present invention uses a laser beam to expose a radiant sensitive film on the workpiece to print circuit patterns on a substrate. The laser beam is aligned using a beam steering means. The laser beam is split into 32 beams to create a brush. The brush scans the workpiece through use of a rotating polygonal mirror. Each beam of the brush may have one of seventeen intensity values. The beams are modulated by an Acousto-Optical Modulator. Signals provided to the Acousto-Optical Modulator define the pattern to be generated. These signals are created by a rasterizer. Increased print speed is accomplished through the use of a wider brush and a print strategy that eliminates physical stage passes.


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