The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2004
Filed:
Mar. 28, 2000
Matthew J. Jolley, Beaverton, OR (US);
Jerry Martyniuk, Portland, OR (US);
H. Christopher Hamaker, Portland, OR (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A semiconductor fabrication gray level photolithography strategy, in which the energy beam intensities corresponding to each gray level are selected from a set of non-linear, non-monotonic intensities. Rasterized geometric shape edges are defined by associating one or more intermediate gray levels with pixels in at least one row of pixels. The geometric shape is printed or imaged on an energy sensitive layer by modulating an energy beam to the intensity corresponding to the associated gray level, and directing the modulated beam to the pixel location on the layer. The intensities corresponding to the gray levels are selected so as to optimize critical dimension (CD) characteristics and other printing features.