Location History:
- late of Castro Valley, CA (US) (2003 - 2004)
- Castro Valley, CA (US) (1982 - 2005)
Company Filing History:
14 out of 63 
12 out of 13,726 
7 out of 801 
Years Active: 1982-2005
Title: Innovations and Contributions of Lee H Veneklasen
Introduction
Lee H Veneklasen, a distinguished inventor based in Castro Valley, California, has made a significant impact in the field of charged particle beam technology. With an impressive portfolio of 38 patents, Veneklasen continues to push the boundaries of innovation in photolithographic systems and other related technologies.
Latest Patents
Among his latest innovations, Veneklasen developed a patent for a "Method of exposing a target to a charged particle beam." This invention features an immersion lens for a charged particle beam lithography system that incorporates a magnetically floating shield. This shield is designed to limit the deflection magnetic field from generating eddy currents in electrically conductive components situated downstream. It effectively maintains the integrity of the focusing magnetic field, which is essential for enhancing the performance of lithographic systems.
Another notable patent is the "Technique for writing with a raster scanned beam." This technique enables the generation of intricate patterns using a raster scanned beam in a photolithographic context. By utilizing a multiple blank position flash cycle, the method enhances efficiency and precision in the creation of patterns, showcasing Veneklasen’s innovative approach to tackling complex challenges in the field.
Career Highlights
Throughout his career, Lee H Veneklasen has been instrumental in the advancement of technologies at several prominent companies including Etec Systems, Inc. and Applied Materials, Inc. His expertise and inventive capabilities have been pivotal in developing systems that are widely utilized in various applications, particularly in semiconductor manufacturing.
Collaborations
Veneklasen's collaborative efforts have also included working alongside notable professionals such as William J DeVore and Sergey Babin. These partnerships have furthered the innovations in their respective fields and have contributed to the success of many of Veneklasen's groundbreaking projects.
Conclusion
Lee H Veneklasen stands out as a prolific inventor whose contributions to charged particle beam technology and photolithography are significant. With 38 patents to his name, his ongoing work serves as an inspiration for future inventors and highlights the importance of innovation in technology. As he continues to innovate, the impact of his work will likely resonate within the industry for years to come.