The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
Mar. 28, 2000
Applicant:
Inventors:
Juan R. Madonado, Palo Alto, CA (US);
Lee H. Veneklasen, Castro Valley, CA (US);
Matthias Brunner, Kirchheim, DE;
Ralf Schmid, Poing, DE;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 4/000 ; H01J 4/700 ; G01N 2/300 ; G21R 7/00 ; G21R 5/10 ; A61N 5/00 ; G21G 5/00 ;
U.S. Cl.
CPC ...
H01J 4/000 ; H01J 4/700 ; G01N 2/300 ; G21R 7/00 ; G21R 5/10 ; A61N 5/00 ; G21G 5/00 ;
Abstract
In a charged particle or electron beam system, gas, such as argon or helium, is introduced over the surface of a substrate and ionized to neutralize charge accumulating on the surface from interactions caused by the impinging charged particles. The gas can be distributed throughout the gas chamber or confined to an area above the substrate. The radiation beam to ionize the gas can be directed across or towards the surface of the substrate. In the latter case, the gas pressure may be reduced to zero.