Company Filing History:
Years Active: 2002
Title: Innovations of Juan R. Madonado in Electron Beam Systems
Introduction
Juan R. Madonado is an accomplished inventor based in Palo Alto, CA. He has made significant contributions to the field of charged particle systems, particularly through his innovative patent related to charge neutralization in electron beam systems. His work is vital for enhancing the efficiency and effectiveness of these systems in various applications.
Latest Patents
Juan R. Madonado holds a patent for the "Charge neutralization of electron beam systems." This invention involves introducing gas, such as argon or helium, over the surface of a substrate and ionizing it to neutralize the charge that accumulates on the surface due to interactions with impinging charged particles. The gas can be distributed throughout the gas chamber or confined to a specific area above the substrate. Additionally, the radiation beam used to ionize the gas can be directed across or towards the surface of the substrate, with the possibility of reducing the gas pressure to zero.
Career Highlights
Juan R. Madonado is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to apply his innovative ideas in practical settings, contributing to advancements in technology.
Collaborations
Throughout his career, Juan has collaborated with notable colleagues, including Lee H. Veneklasen and Matthias Brunner. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Juan R. Madonado's contributions to the field of electron beam systems exemplify the impact of innovation in technology. His patent on charge neutralization showcases his expertise and commitment to advancing the industry.