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Rochester, NY, United States of America

Cvc Products, Inc.

USPTO Granted Patents = 46

% Expired Patents = 6.5

Forward Citations = 2,270

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31 inventors (with patents filed for the assignee):

Mehrdad M Moslehi (39 out of 238 patents)

Thomas R Omstead (13 out of 20 patents)

Ajit P Paranjpe (11 out of 55 patents)

4. Cecil J Davis (10 out of 92 patents)

5. Dorian Heimanson (10 out of 15 patents)

6. Randhir S Bubber (7 out of 9 patents)

7. Lino A Velo (7 out of 13 patents)

8. William J Messner (6 out of 13 patents)

9. Shiyuan Cheng (5 out of 6 patents)

10. Panya Wongsenakhum (5 out of 5 patents)

11. William Starks (5 out of 7 patents)

12. Edward J Nagy (5 out of 5 patents)

13. Yong Jin Lee (5 out of 44 patents)

14. Sanjay Gopinath (4 out of 33 patents)

15. David R Campbell, Sr (4 out of 4 patents)

Core Competencies:

Thin-Film Processing

Physical-Vapor Deposition

Semiconductor Interconnect

Chemical-Vapor Deposition

Magnetic Orientation

Thermally Conductive Chuck

Multi-Zone Gas Injection

Rapid Thermal Processing

Adhesion Promotion Layer

Ultra-High Vacuum

Sputtering Apparatus

Temperature Control

46 patents: Sort by Forward Citations

1. 6905578 - Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure (2005-06-14),

2. 6812126 - Method for fabricating a semiconductor chip interconnect (2004-11-02),

3. 6705394 - Rapid cycle chuck for low-pressure processing (2004-03-16),

4. 6692575 - Apparatus for supporting a substrate in a reaction chamber (2004-02-17),

5. 6645847 - Microelectronic interconnect material with adhesion promotion layer and fabrication method (2003-11-11),

6. 6627995 - Microelectronic interconnect material with adhesion promotion layer and fabrication method (2003-09-30),

7. 6596133 - Method and system for physically-assisted chemical-vapor deposition (2003-07-22),

8. 6544341 - System for fabricating a device on a substrate with a process gas (2003-04-08),

9. 6508885 - Edge sealing structure for substrate in low-pressure processing environment (2003-01-21),

10. 6508197 - Apparatus for dispensing gas for fabricating substrates (2003-01-21),

11. 6475359 - Thin-film processing electromagnet with modified core for producing low-skew magnetic orientation (2002-11-05),

12. 6461675 - Method for forming a copper film on a substrate (2002-10-08),

13. 6444263 - Method of chemical-vapor deposition of a material (2002-09-03),

14. 6444103 - Method and apparatus for thin film deposition using an active shutter (2002-09-03),

15. 6378600 - Thermally conductive chuck with thermally separated sealing structures (2002-04-30),

Company Overview

Cvc Products, Inc., based in Rochester, NY, specializes in advanced manufacturing technologies, particularly in the fields of physical-vapor deposition and chemical-vapor deposition. The company focuses on thin-film processing and semiconductor fabrication, providing innovative solutions for microelectronic interconnects. With expertise in inductively-coupled plasma technology and thermally conductive chucks, Cvc Products plays a crucial role in enhancing the performance and reliability of electronic components through precise material application and processing techniques.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

46 Patents

#24 in Rochester, NY

#472 in New York

#7,597 in US

#15,110 in the World

Rochester, NY, United States of America

Cvc Products, Inc.

Forward Citations = 2,270

31 inventors:

Mehrdad M Moslehi (39 out of 238 patents)

Thomas R Omstead (13 out of 20 patents)

Ajit P Paranjpe (11 out of 55 patents)

4. Cecil J Davis (10 out of 92 patents)

5. Dorian Heimanson (10 out of 15 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Cvc Products, Inc.. Retrieved from https://idiyas.com/company/cvc-products

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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