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For the Inventor, By the Inventor

Beijing, China

Beijing Naura Microelectronics Equipment Co., Ltd.

Calculating rank
USPTO Granted Patents = 14


Forward Citations = 0

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45 inventors (with patents filed for the assignee):

goldMedal Gang Wei (2 out of 32 patents)

silverMedal Jianguo Li (2 out of 57 patents)

bronzeMedal Hongyu Zhao (2 out of 23 patents)

4.  Aibing Li (2 out of 2 patents)

5.  Wei Wang (1 out of 512 patents)

6.  Qi Wang (1 out of 72 patents)

7.  Jing Yang (1 out of 46 patents)

8.  Chao Zhang (1 out of 101 patents)

9.  Xingfei Mao (1 out of 5 patents)

10.  Jing Wang (1 out of 484 patents)

11.  Di Zhang (1 out of 92 patents)

12.  Lu Xu (1 out of 3 patents)

13.  Jun Zhang (1 out of 110 patents)

14.  Zhongwei Jiang (1 out of 3 patents)

15.  Rui Gao (1 out of 21 patents)


14 patents:

1. 12765289 - Method for etching silicon wafer (2026-10-13),
2. 12749654 - Semiconductor processing equipment and impedance-matching method (2026-09-29),
3. 12749651 - Semiconductor reaction chamber (2026-09-29),
4. 12731766 - Substrate support including multiple radio frequency (RF) electrodes (2026-09-08),
5. 12701966 - Semiconductor process device and wafer support structure thereof (2026-08-04),
6. 12696721 - Furnace tube assembly and disassembly auxiliary device (2026-07-28),
7. 12648410 - Chuck structure of semiconductor cleaning apparatus and semiconductor cleaning apparatus (2026-06-02),
8. 12648409 - Wafer carrying apparatus and semiconductor process device (2026-06-02),
9. 12637754 - Oxide film preparation method (2026-05-26),
10. 12635476 - Wafer cleaning equipment, wafer chuck, and wafer cleaning method (2026-05-19),
11. 12632630 - Semiconductor equipment modeling method and device (2026-05-19),
12. 12577669 - Gas injection device of semiconductor thermal processing equipment and semiconductor thermal processing equipment (2026-03-17),
13. 12571103 - Semiconductor process device and process chamber thereof (2026-03-10),
14. 12562341 - Base bias adjustment apparatus and method, and semiconductor process device (2026-02-24),
Company Overview
Beijing Naura Microelectronics Equipment Co., Ltd. specializes in the development and manufacturing of advanced semiconductor equipment. The company focuses on providing innovative solutions for the microelectronics industry, particularly in areas such as etching, deposition, and cleaning processes. With a strong emphasis on research and development, Naura plays a significant role in enhancing the capabilities of semiconductor fabrication, catering to both domestic and international markets. Its commitment to technological advancement positions it as a key player in the microelectronics sector.
Profile summary synthesized from public USPTO records and patent filings.

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USPTO Data Jan 1 1976 - Oct 27 2026

14 Patents

#215 in Beijing

#2,054 in China

#42,312 in the World

Beijing, CN
Beijing, China

Beijing Naura Microelectronics Equipment Co., Ltd.

Forward Citations = 0

45 inventors:

goldMedal Gang Wei (2 out of 32 patents)

silverMedal Jianguo Li (2 out of 57 patents)

bronzeMedal Hongyu Zhao (2 out of 23 patents)

4.  Aibing Li (2 out of 2 patents)

5.  Wei Wang (1 out of 512 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Beijing Naura Microelectronics Equipment Co., Ltd.. Retrieved from https://idiyas.com/company/beijing-naura-microelectronics-equipment

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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