The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Sep. 01, 2022
Beijing Naura Microelectronics Equipment Co., Ltd., Beijing, CN;
Liguang Lan, Beijing, CN;
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing, CN;
Abstract
The present disclosure provides a gas injection device of semiconductor thermal processing equipment and the semiconductor thermal processing equipment. The device includes an inlet pipe. A first pipe segment includes a first pipe wall and a second pipe wall embedded in the first pipe wall. A buffer space is formed between an inner wall of the first pipe wall and an outer wall of the second pipe wall. A plurality of first air holes are evenly distributed along a vertical direction on the first pipe wall, and the first air holes are communicated with the buffer space and the process chamber. A plurality of second air holes are arranged on the second pipe wall, and the second air holes are communicated with the internal space of the second pipe wall and the buffer space.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile