The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Mar. 29, 2024
Beijing Naura Microelectronics Equipment Co., Ltd., Beijing, CN;
Wenqing Li, Beijing, CN;
Gang Wei, Beijing, CN;
Jing Yang, Beijing, CN;
Shuqi Jiang, Beijing, CN;
Di Zhang, Beijing, CN;
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing, CN;
Abstract
An impedance-matching method applied to semiconductor processing equipment includes a processing preparation step and a processing ignition step. The processing preparation step includes obtaining currently stored impedance-matching data corresponding to a processing ignition step. The impedance-matching data includes a parameter adjustment position corresponding to a parameter adjustable device in an impedance-matching device of the semiconductor processing equipment. The processing preparation step further includes adjusting a parameter value of the parameter adjustable device based on the parameter adjustment position. The processing ignition step includes applying radio frequency (RF) power to a processing chamber of the semiconductor processing equipment through the impedance-matching device, performing impedance matching through the impedance-matching device, and determining a current parameter adjustment position of the parameter adjustable device when impedance is matched, and updating the impedance-matching data based on the current parameter adjustment position.