The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Aug. 25, 2022
Beijing Naura Microelectronics Equipment Co., Ltd., Beijing, CN;
Yulin Peng, Beijing, CN;
Jinrong Zhao, Beijing, CN;
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing, CN;
Abstract
The present disclosure generally relates to plasma semiconductor processing and processing tools for such processing. A processing tool includes a chamber and a substrate support. The substrate support is disposed inside the chamber. The substrate support includes a support surface configured to support a semiconductor substrate inside the chamber. The substrate support includes a plurality of radio frequency (RF) electrodes. The dimension of each lateral side of each RF electrode of the RF electrodes is equal to or less than 2% of a wavelength of an RF signal applied to the respective RF electrode. The respective dimension is in a plane parallel to the support surface. The RF electrodes are configured to control plasma in the internal volume in the chamber.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile