The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2017
Filed:
Dec. 31, 2015
Applicant:
Applied Materials Israel Ltd., Rehovot, IL;
Inventors:
Roman Kris, Jerusalem, IL;
Yakov Weinberg, Modi'in, IL;
Yan Ivanchenko, Nes-Ziona, IL;
Ishai Schwarzband, Or-Yehuda, IL;
Dan Lange, Haifa, IL;
Arbel Englander, Tel Aviv, IL;
Efrat Noifeld, Rehovot, IL;
Ran Goldman, Hod Hasharon, IL;
Ori Shoval, Ashdod, IL;
Assignee:
Applied Materials Israel Ltd, Rehovot, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); H01J 37/28 (2006.01); G01N 23/225 (2006.01); G01B 15/04 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); G01B 15/04 (2013.01); G01N 23/2251 (2013.01); H01J 37/28 (2013.01); G01N 2223/07 (2013.01); G01N 2223/102 (2013.01); G01N 2223/401 (2013.01); G01N 2223/418 (2013.01); G01N 2223/6116 (2013.01); G01N 2223/646 (2013.01); H01J 2237/24592 (2013.01); H01J 2237/2813 (2013.01);
Abstract
A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference to results of the CD-measurements.