Rehovot, Israel

Efrat Noifeld


Average Co-Inventor Count = 10.3

ph-index = 1


Location History:

  • Rehovot, IL (2017)
  • Nes Ziona, IL (2023)

Company Filing History:


Years Active: 2017-2023

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2 patents (USPTO):Explore Patents

Title: Efrat Noifeld: Innovator in Semiconductor Metrology

Introduction

Efrat Noifeld is a prominent inventor based in Rehovot, Israel, known for her contributions to semiconductor technology. With a total of two patents to her name, she has made significant strides in the field of 3D-NAND CDSEM metrology.

Latest Patents

Her latest patents include a method, system, and computer program product for 3D-NAND CDSEM metrology. This innovative method focuses on process control of semiconductor structures fabricated through a series of steps. It involves obtaining an image of the semiconductor structure, which indicates at least two individual fabrication steps. The image is generated by scanning the structure with a charged particle beam and collecting signals emanating from it. A hardware processor then processes the image to determine parameters of the semiconductor structure, measuring specific steps as individual features. Another notable patent is the CD-SEM technique for wafer fabrication control. This patent describes a Critical Dimensions Scanning Electron Microscope (CD-SEM) that includes a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image of the wafer, and a unit for GL analysis that processes the results in reference to the CD-measurements.

Career Highlights

Efrat Noifeld is currently employed at Applied Materials Israel Limited, where she continues to push the boundaries of semiconductor technology. Her work has been instrumental in enhancing the precision and efficiency of semiconductor fabrication processes.

Collaborations

Throughout her career, Efrat has collaborated with notable colleagues, including Roman Kris and Ishai Schwarzband. These partnerships have contributed to her innovative approaches and successful patent applications.

Conclusion

Efrat Noifeld's contributions to semiconductor metrology exemplify her dedication to innovation in technology. Her patents reflect her expertise and commitment to advancing the field, making her a significant figure in the industry.

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