Ashdod, Israel

Ori Shoval


Average Co-Inventor Count = 6.4

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2015-2017

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2 patents (USPTO):Explore Patents

Title: Ori Shoval: Innovator in Semiconductor Technology

Introduction

Ori Shoval is a prominent inventor based in Ashdod, Israel. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to wafer fabrication control and overlay error measurement methods.

Latest Patents

One of Ori Shoval's latest patents is the development of a Critical Dimensions Scanning Electron Microscope (CD-SEM) technique for wafers fabrication control. This invention includes a unit for performing CD-SEM measurements of a semiconductor wafer, a Backscattered Electron (BSE) imaging unit for obtaining a Grey Level image of the wafer, and a unit for Grey Level analysis that processes the results in reference to the CD-measurements. Another notable patent involves high electron energy-based overlay error measurement methods and systems. This method encompasses obtaining first area information from a first layer of an inspected object, directing electrons of a primary electron beam to interact with both the first and second areas, and generating detection signals to determine spatial relationships between features of the layers.

Career Highlights

Ori Shoval is currently employed at Applied Materials Israel Limited, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing techniques that enhance the precision and efficiency of semiconductor manufacturing processes.

Collaborations

Ori collaborates with talented professionals in his field, including Moshe Langer and Ofer Adan. Their combined expertise contributes to the innovative projects at Applied Materials Israel Limited.

Conclusion

Ori Shoval's contributions to semiconductor technology through his patents and work at Applied Materials Israel Limited highlight his role as a key innovator in the industry. His advancements in wafer fabrication control and overlay error measurement methods are paving the way for future developments in semiconductor manufacturing.

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