Tel Aviv, Israel

Arbel Englander

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials Israel Limited. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Arbel Englander. Retrieved from https://idiyas.com/inventor/arbel-englander

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Arbel Englander: Innovator in Semiconductor Technology

Introduction

Arbel Englander is a prominent inventor based in Tel Aviv, Israel. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to wafer fabrication control.

Latest Patents

Arbel Englander holds a patent for the CD-SEM technique, which stands for Critical Dimensions Scanning Electron Microscope. This advanced technology comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a Backscattered Electron (BSE) imaging unit for obtaining a Grey Level image of the wafer, and a unit for Grey Level analysis. The results of the GL analysis are processed with reference to the results of the CD measurements. This patent showcases his expertise in enhancing the precision of semiconductor manufacturing processes.

Career Highlights

Arbel Englander is currently employed at Applied Materials Israel Limited, where he continues to push the boundaries of semiconductor technology. His work focuses on improving fabrication control, which is crucial for the advancement of electronic devices.

Collaborations

Arbel collaborates with notable colleagues, including Roman Kris and Yakov Weinberg, who contribute to the innovative environment at Applied Materials Israel Limited.

Conclusion

Arbel Englander is a key figure in the semiconductor industry, with a patent that exemplifies his commitment to innovation and excellence. His contributions are vital for the ongoing development of advanced manufacturing techniques in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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