The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 1994
Filed:
Aug. 21, 1992
Hidekatsu Kohara, Chigasaki, JP;
Hatsuyuki Tanaka, Samukawa, JP;
Masanori Miyabe, Fujisawa, JP;
Yoshiaki Arai, Mountain View, CA (US);
Shingo Asaumi, Fujisawa, JP;
Toshimasa Nakayama, Hiratsuka, JP;
Akira Yokota, Yamato, JP;
Hisashi Nakane, Yokohama, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawaski, JP;
Abstract
A positive-working photoresist composition suitable for fine patterning in the manufacture of semiconductor devices, e.g., VLSIs, with high fidelity is proposed. The composition comprises 100 parts by weight of a cresol novolac resin and 25-60 parts by weight of a naphthoquinone diazide sulfonic acid ester as the photosensitive component while the cresol novolac resin component is prepared from a mixture of cresol isomers composed of 35-43% of m-cresol and 65-57% of p-cresol with substantial absence of o-cresol or composed of 35-43% of m-cresol, 65-57% of p-cresol and 1% or less of o-cresol.