Chigasaki, Japan

Hatsuyuki Tanaka


Average Co-Inventor Count = 4.1

ph-index = 11

Forward Citations = 269(Granted Patents)


Location History:

  • Samakawa, JP (1989)
  • Samukawa, JP (1988 - 1994)
  • Kanagawa, JP (1995 - 1996)
  • Kanagawa-ken, JP (1996 - 1997)
  • Chigasaki, JP (1992 - 2001)

Company Filing History:


Years Active: 1988-2001

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21 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Hatsuyuki Tanaka in Semiconductor Technology**

Introduction

Hatsuyuki Tanaka, based in Chigasaki, Japan, is a prominent inventor with a remarkable portfolio of 21 patents. His innovative work focuses primarily on the development of aqueous solutions for actinic ray-sensitive resists, crucial for semiconductor fabrication. Tanaka’s inventions contribute significantly to enhancing the quality and efficiency of semiconductor devices.

Latest Patents

Tanaka's latest patents include groundbreaking solutions such as the "Developer Solution for Actinic Ray Sensitive Resist." This patent outlines a novel aqueous developer that effectively mitigates issues like film residue and scum deposition during the manufacture of semiconductor devices. The developer comprises a nitrogen-containing organic basic compound, like tetramethyl ammonium hydroxide, and an anionic surface-active agent, specifically a diphenyl ether compound with at least one ammonium sulfonate group.

Another significant invention is the "Developer Solution for Photoresist Composition," which offers an improved formulation for alkali-developable photoresist. This solution incorporates an inorganic ammonium salt alongside traditional components like a water-soluble organic basic compound and a surface-active agent. The unique additives enhance the quality of the patterned resist layer, ensuring the absence of scums while improving the light exposure dose latitude and focusing depth range during the resist layer exposure process.

Career Highlights

Hatsuyuki Tanaka's affiliation with Tokyo Ohka Kogyo Co., Ltd. has been instrumental in propelling his research and development in semiconductor materials. His expertise in developing advanced solutions for photoresist compositions has established him as a key figure in the field. Tanaka's innovations play a crucial role in enhancing the reliability and performance of semiconductor devices, meeting the growing demands for advanced electronic applications.

Collaborations

Throughout his career, Tanaka has collaborated with talented colleagues, including Toshimasa Nakayama and Hidekatsu Kohara. This collaboration fosters a creative environment that sparks new ideas and innovations, further advancing the technology in semiconductor manufacturing.

Conclusion

Hatsuyuki Tanaka's contributions to the field of semiconductor technology through his patents demonstrate his commitment to innovation. His work not only enhances the manufacturing processes but also impacts the broader electronics industry, paving the way for more efficient and reliable semiconductor devices. As technology continues to evolve, Tanaka’s inventions will likely remain at the forefront of semiconductor advancements.

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