Yokohama, Japan

Yoshiaki Arai


Average Co-Inventor Count = 6.9

ph-index = 2

Forward Citations = 49(Granted Patents)


Location History:

  • Yokohama, JP (1988 - 1989)
  • Mountain View, CA (US) (1994)

Company Filing History:


Years Active: 1988-1994

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Yoshiaki Arai: Innovator in Semiconductor Photoresist Technology

Introduction

Yoshiaki Arai is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of photoresist materials. With a total of 3 patents to his name, Arai's work has been instrumental in advancing the technology used in fine patterning for semiconductor devices.

Latest Patents

Arai's latest patents include a positive-working photoresist containing o-naphthoquinone diazide. This composition is designed for high-fidelity fine patterning in the manufacture of semiconductor devices, such as VLSIs. The formulation consists of 100 parts by weight of a cresol novolac resin and 25-60 parts by weight of a naphthoquinone diazide sulfonic acid ester. The cresol novolac resin is prepared from a mixture of cresol isomers, ensuring minimal presence of o-cresol.

Another notable patent is the positive-working photosensitive quinone diazide composition with alkali. This innovative composition serves as a photoresist material for fine patterning in semiconductor manufacturing. It features a combination of alkali-insoluble and alkali-soluble dyes, which significantly reduces halation effects caused by underlying aluminum coatings. This results in a high-fidelity reproduction of patterns, even in submicron ranges.

Career Highlights

Yoshiaki Arai is currently employed at Tokyo Ohka Kogyo Co., Ltd., a leading company in the semiconductor materials industry. His work has not only contributed to the company's success but has also positioned him as a key figure in the field of photoresist technology.

Collaborations

Arai has collaborated with notable coworkers, including Hidekatsu Kohara and Hatsuyuki Tanaka. Their combined expertise has further enhanced the development of innovative photoresist materials.

Conclusion

Yoshiaki Arai's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in photoresist materials, paving the way for future innovations in semiconductor manufacturing.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…