Location History:
- Kawasaki, JA (1977)
- Kanagawa, JP (1985 - 1987)
- Kawasaki, JP (1979 - 1990)
- Yokohama, JP (1988 - 1994)
Company Filing History:
15 out of 1,233 
13 out of 23 
5 out of 6 Years Active: 1977-1994
Title: **The Innovations of Hisashi Nakane: A Pioneering Inventor in Semiconductor Manufacturing**
Introduction
Hisashi Nakane, an esteemed inventor based in Kawasaki, JP, has made significant contributions to the field of semiconductor manufacturing. With a remarkable portfolio of 36 patents, his innovative approach to developing photoresist materials has garnered attention and respect within the industry.
Latest Patents
Hisashi Nakane's latest inventions include a **positive-working photoresist containing o-naphthoquinone diazide**. This composition is designed for fine patterning in the manufacturing of semiconductor devices, such as very-large-scale integrations (VLSIs), ensuring high fidelity. The formulation includes 100 parts by weight of a cresol novolac resin and 25-60 parts by weight of a naphthoquinone diazide sulfonic acid ester as the photosensitive component. The cresol novolac resin is prepared from a mixture of cresol isomers, featuring a significant absence of o-cresol.
Moreover, he has developed a **remover solution for photoresist** that consists of a solvent, typically water, along with an inorganic or organic alkaline compound, such as sodium or potassium hydroxides, and a borohydride compound. This remover solution is particularly effective for eliminating patterned photoresist layers during the manufacturing process of electronic circuit board substrates, resulting in high-quality products without discoloration or denaturation of the copper and solder surfaces.
Career Highlights
Throughout his career, Hisashi Nakane has been associated with notable companies, including Tokyo Ohka Kogyo Co., Ltd. and Tokyo Ohka Kogyo Kabushiki Kaisha. His work at these institutions has positioned him as a key figure in advancing technologies related to photoresists and semiconductor manufacturing.
Collaborations
Hisashi Nakane has collaborated with esteemed coworkers, including Akira Yokota and Akira Uehara, who have contributed to his innovative projects. Together, they have worked to enhance the performance and usability of photoresist materials, propelling advancements in semiconductor technologies.
Conclusion
Hisashi Nakane's inventive spirit and commitment to innovation in the semiconductor field have led to the emergence of advanced materials and processes that continue to shape the industry. With 36 patents to his name, his impact is evident, and his contributions will undoubtedly influence the future of semiconductor manufacturing for years to come.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.