The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 1988
Filed:
May. 16, 1986
Applicant:
Inventor:
Hisashi Nakane, Kawasaki, JP;
Assignee:
Tokyo Ohka Kogyo Kabushiki Kaisha, Kanagawa, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430311 ; 430-5 ; 430321 ; 430322 ; 430327 ;
Abstract
A photomask, used for the photolithographic fine patterning of a photoresist film in the preparation of semiconductors, is provided with a thin film of a polymeric material having resilient elasticity to cover the patterned masking layer and the surface of the substrate plate altogether so that very intimate contact is obtained between the photomask and the photoresist film contributing to a great increase in the resolving power in addition to the advantages of decreased stain and scratch formation on the surface of the photomask resulting in an increased productivity of semiconductor devices.