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Kawasaki, Japan

Tokyo Ohka Kogyo Kabushiki Kaisha

USPTO Granted Patents = 23

Trademarks = 6

Forward Citations = 494

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34 inventors (with patents filed for the assignee):

Hisashi Nakane (13 out of 36 patents)

Akira Uehara (6 out of 27 patents)

Toshimi Aoyama (3 out of 5 patents)

4. Minoru Tsuda (3 out of 5 patents)

5. Yoichi Nakamura (3 out of 5 patents)

6. Shozo Toda (3 out of 5 patents)

7. Hiroyuki Kiyota (3 out of 3 patents)

8. Muneo Nakayama (2 out of 28 patents)

9. Isamu Hijikata (2 out of 17 patents)

10. Shingo Asaumi (2 out of 12 patents)

11. Akira Yokota (2 out of 13 patents)

12. Shunichi Kasukawa (2 out of 2 patents)

13. Takayuki Sato (2 out of 2 patents)

14. Shigekazu Miyazaki (2 out of 2 patents)

15. Wataru Kanai (2 out of 3 patents)

23 patents: Sort by Forward Citations

1. 4735890 - Photomasks for photolithographic fine patterning (1988-04-05),

2. 4525276 - Apparatus for separation of immiscible liquids (1985-06-25),

3. 4483651 - Automatic apparatus for continuous treatment of leaf materials with gas (1984-11-20),

4. 4468447 - Photosensitive bisazide composition for dry development (1984-08-28),

5. 4413091 - Photosensitive polymer and photosensitive material for photomechanical (1983-11-01),

6. 4388397 - Photosensitive composition for dry development (1983-06-14),

7. 4385086 - Method for preventing leaching of contaminants from solid surfaces (1983-05-24),

8. 4384011 - Process for producing gravure printing plates (1983-05-17),

9. 4336438 - Apparatus for automatic semi-batch sheet treatment of semiconductor (1982-06-22),

10. 4318767 - Apparatus for the treatment of semiconductor wafers by plasma reaction (1982-03-09),

11. 4304832 - Photosensitive resin composition containing diazodiphenylamine-aldehyde (1981-12-08),

12. 4297433 - Light sensitive compositions of polymethyl isopropenyl ketone (1981-10-27),

13. 4287289 - Photoresist cyclized rubber and bisazide compositions containing a (1981-09-01),

14. 4277525 - Liquid compositions for forming silica coating films (1981-07-07),

15. 4276369 - Photo--imaging a polymethyl isopropenyl ketone (PMIPK) composition (1981-06-30),

Tokyo Ohka Kogyo Kabushiki Kaisha (TOK) is a leading manufacturer of specialty chemicals and materials used in the semiconductor, display, and electronic components industries. With a reputation for innovation and quality, TOK provides cutting-edge solutions to help customers achieve success in their industries.

This text is generated by artificial intelligence and may not be accurate.

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USPTO Data Jan 1 1976 - Dec 9 2025

23 Patents

#31 in Kawasaki

#2,644 in Japan

#26,790 in the World

Kawasaki, Japan

Tokyo Ohka Kogyo Kabushiki Kaisha

Forward Citations = 494

34 inventors:

Hisashi Nakane (13 out of 36 patents)

Akira Uehara (6 out of 27 patents)

Toshimi Aoyama (3 out of 5 patents)

4. Minoru Tsuda (3 out of 5 patents)

5. Yoichi Nakamura (3 out of 5 patents)

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