Fujisawa, Japan

Shingo Asaumi


Average Co-Inventor Count = 4.9

ph-index = 10

Forward Citations = 277(Granted Patents)


Company Filing History:


Years Active: 1979-1994

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12 patents (USPTO):Explore Patents

Title: **Innovations of Shingo Asaumi: Pioneering Developments in Photoresist Technology**

Introduction

Shingo Asaumi, an accomplished inventor based in Fujisawa, Japan, has made significant contributions to the field of semiconductor device manufacturing. With a prolific portfolio of 12 patents, Asaumi focuses on developing advanced photoresist compositions that are essential for producing high-fidelity semiconductor devices, such as Very Large Scale Integrations (VLSIs).

Latest Patents

Among Asaumi's notable patents is the **Positive-working photoresist containing o-naphthoquinone diazide**. This innovative composition is designed for fine patterning in semiconductor manufacturing, enhancing the precision and fidelity of the processes involved. The formula includes 100 parts by weight of a cresol novolac resin and 25-60 parts by weight of a naphthoquinone diazide sulfonic acid ester, crafted from a specific mixture of cresol isomers. Another significant patent is the **Positive-working photoresist composition with quinone diazide sulfonic**. This composition comprises 100 parts by weight of a phenolic novolac resin, created through a unique condensation reaction, along with 20-60 parts by weight of a photosensitizer, usually an ester of naphthoquinone diazidesulfonic acid, ensuring superior results for fine patterning in semiconductor devices.

Career Highlights

Shingo Asaumi has had an impactful career with prominent companies in the semiconductor industry, including Tokyo Ohka Kogyo Co., Ltd., and Tokyo Ohka Kogyo Kabushiki Kaisha. His work at these firms played a pivotal role in advancing photoresist technologies, significantly influencing the production efficiency and quality of semiconductor manufacturing.

Collaborations

Throughout his career, Asaumi has worked alongside notable professionals such as Hatsuyuki Tanaka and Hisashi Nakane. These collaborations have fostered a creative environment that has led to groundbreaking innovations in the realm of photoresist development.

Conclusion

In conclusion, Shingo Asaumi is a leading inventor whose work focuses on enhancing the efficiency and precision of semiconductor manufacturing through innovative photoresist compositions. His contributions, supported by a strong network of collaborations and experience with industry-leading companies, continue to drive advancements in this crucial technology sector.

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