Company Filing History:
11 out of 1,233 
2 out of 23 Years Active: 1979-1994
Title: Akira Yokota: Innovator in Photoresist Technology
Introduction
Akira Yokota is a prominent inventor based in Yamato, Japan, known for his significant contributions to the field of semiconductor manufacturing. With a total of 13 patents to his name, Yokota has made remarkable advancements in photoresist technology, which is crucial for the production of integrated circuits.
Latest Patents
One of his latest patents is a positive-working photoresist containing o-naphthoquinone diazide. This composition is designed for fine patterning in the manufacture of semiconductor devices, such as VLSIs, ensuring high fidelity. The formulation includes 100 parts by weight of a cresol novolac resin and 25-60 parts by weight of a naphthoquinone diazide sulfonic acid ester as the photosensitive component. The cresol novolac resin is derived from a mixture of cresol isomers, specifically 35-43% m-cresol and 65-57% p-cresol, with minimal or no o-cresol present. Another notable patent involves an undercoating material for photosensitive resins. This undercoating composition is essential for providing a robust layer beneath a top coat of a photosensitive resist layer on a substrate surface. It comprises a condensation product from a hydroxy-substituted diphenylamine and a melamine compound, which enhances the fidelity of pattern reproduction in photolithographic techniques.
Career Highlights
Throughout his career, Akira Yokota has worked with notable companies, including Tokyo Ohka Kogyo Co., Ltd. and Tokyo Ohka Kogyo Kabushiki Kaisha. His work has significantly impacted the semiconductor industry, particularly in the development of materials that improve the efficiency and accuracy of photolithography.
Collaborations
Yokota has collaborated with several professionals in his field, including Hisashi Nakane and Shingo Asaumi, who have contributed to his research and development efforts.
Conclusion
Akira Yokota's innovative work in photoresist technology has established him as a key figure in the semiconductor manufacturing industry. His patents reflect a commitment to advancing the capabilities of photolithography, ensuring the continued evolution of electronic devices.
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