Company Filing History:
6 out of 3,086 
1 out of 1 Years Active: 2024-2025
Title: Innovations of Zhaowu Liu in Holographic Grating Technology
Introduction
Zhaowu Liu is a prominent inventor based in Changchun, China. He has made significant contributions to the field of holographic grating technology, holding a total of 7 patents. His work focuses on improving the quality and precision of grating systems, which are essential in various optical applications.
Latest Patents
One of Liu's latest patents is a method and device for compensating surface error of holographic grating substrate. This invention addresses the challenges posed by surface processing errors that can degrade the diffraction wavefront quality of gratings. By utilizing phase modulation of interference fringes in a scanning beam interference lithography system, Liu's method enhances the full-aperture diffraction wavefront quality of the grating.
Another notable patent is the Littrow grating interferometry device. This device incorporates a two-frequency orthogonal polarization light source and a polarizing beam splitting prism, among other components. It achieves secondary diffraction under Littrow incidence, significantly improving the precision of displacement measurement in grating interferometry.
Career Highlights
Zhaowu Liu has worked with esteemed institutions such as the Chinese Academy of Sciences and the Changchun Institute of Optics, Fine Mechanics and Physics. His experience in these organizations has allowed him to develop and refine his innovative technologies in the field of optics.
Collaborations
Throughout his career, Liu has collaborated with notable colleagues, including Wenhao Li and Wei Wang. These partnerships have contributed to the advancement of research and development in holographic grating technology.
Conclusion
Zhaowu Liu's contributions to the field of holographic grating technology are noteworthy. His innovative patents and collaborations have significantly advanced the precision and quality of optical systems. His work continues to influence the development of advanced grating technologies.
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