The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Feb. 11, 2025
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun, CN;
Wenhao Li, Changchun, CN;
Wenyuan Zhou, Changchun, CN;
Zhaowu Liu, Changchun, CN;
Yujia Sun, Changchun, CN;
Lin Liu, Changchun, CN;
Abstract
The invention relates to the technical field of grating interferometry, in particular to a Littrow grating interferometry device and a use thereof. The device comprises: a two-frequency orthogonal polarization light source, a polarizing beam splitting prism, a reflection assembly, a detector, and a first diffraction grating and a second diffraction grating having identical parameters. The output light of the two-frequency orthogonal polarization light source is split by the polarizing beam splitting prism into horizontally polarizing measuring light which is transmitted and vertically polarizing measuring light which is reflected. The two beams of measuring light undergo diffraction twice between the first diffraction grating and the second diffraction grating, and finally the two beams of measuring light interfere with each other and are incident on the detector. Grating displacement is calculated according to the interference pattern. The invention achieves secondary diffraction under Littrow incidence, and improves the precision of displacement measurement.