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For the Inventor, By the Inventor

San Jose, CA, United States of America

Zeqing Shen

This inventor holds 23 USPTO granted patents and 12 published patent applications, primarily in Carbon-Based Film Deposition. Top assignees: Applied Materials, Inc., National University of Singapore. Active years: 2022-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zeqing Shen. Retrieved from https://idiyas.com/inventor/zeqing-shen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 60.9

Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • San Jose, CA (US) (2022 - 2024)
  • Santa Clara, CA (US) (2024)

Company Filing History:

goldMedal23 out of 14,454 
 
Applied Materials, Inc.
 patents
silverMedal1 out of 854 
 
National University of Singapore
 patents
where one patent can have more than one assignee

Years Active: 2022-2026

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Areas of Expertise:
Nucleation Inhibition
Amorphous-Silicon
Line Edge Roughness
EUV Patterning
Carbon Replenishment
Area Selective Deposition
Low-K Films
Molecular Layer Deposition
3D NAND
Thermal Deposition
Silicon Oxide
23 patents (USPTO):Explore Patents
1. 12765338 - Molecular layer deposition carbon masks for direct selective deposition of silicon-containing materials (2026-10-13),
2. 12733416 - Sin gap fill via nucleation inhibition (2026-09-08),
3. 12727416 - Processes to deposit amorphous-silicon etch protection liner (2026-09-01),
4. 12713850 - CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL (2026-08-18),
5. 12696737 - Compressive films for large area gapfill (2026-07-28),
6. 12666891 - Area selective carbon-based film deposition (2026-06-23),
7. 12650648 - Method to reduce line edge roughness for EUV photoresist pattern (2026-06-09),
8. 12628623 - Selective deposition for sub 20 nm pitch EUV patterning (2026-05-12),
9. 12610791 - Method of forming carbon-based spacer for EUV photoresist patterns (2026-04-21),
10. 12438050 - Electronic device fabrication using area-selective deposition (2025-10-07),
11. 12027374 - Processes to deposit amorphous-silicon etch protection liner (2024-07-02),
12. 11990369 - Selective patterning with molecular layer deposition (2024-05-21),
13. 11972940 - Area selective carbon-based film deposition (2024-04-30),
14. 11830729 - Low-k boron carbonitride films (2023-11-28),
15. 11756785 - Molecular layer deposition contact landing protection for 3D NAND (2023-09-12),

Title: Zeqing Shen: A Pioneer in Semiconductor Innovations

Introduction

Zeqing Shen is a prominent inventor based in San Jose, CA, USA, with an impressive portfolio that includes 13 patents in the field of semiconductor technology. His innovative approaches contribute significantly to the advancement of electronic devices, particularly in the area of memory devices.

Latest Patents

Among Shen's latest patents are groundbreaking processes aimed at enhancing the fabrication of electronic devices. One notable patent details methods for depositing amorphous-silicon etch protection liners. This invention encompasses a comprehensive method that includes forming a film stack on a substrate, followed by precise etching processes to create openings between structures and the selective deposition of etch protection liners.

Another significant invention involves selective patterning with molecular layer deposition. This technique allows for the formation of a layer of carbon-containing material on a substrate within a semiconductor processing chamber, providing enhanced selective deposition capabilities over metal-containing materials. These patents illustrate Shen's commitment to improving semiconductor processing and device efficiency.

Career Highlights

Zeqing Shen's career includes noteworthy contributions to several esteemed institutions, including Applied Materials, Inc. and the National University of Singapore. His work at these organizations has positioned him at the forefront of semiconductor innovation, allowing him to develop cutting-edge technologies that have the potential to reshape the industry.

Collaborations

Throughout his career, Shen has collaborated with numerous talented professionals, including Abhijit Basu Mallick and Bo Qi. These collaborative efforts have not only enriched his work but have also fostered an environment of innovation and creativity within the field.

Conclusion

Zeqing Shen's contributions to the realm of semiconductor technology through his inventions and patents exemplify his dedication to pushing the boundaries of electronic device fabrication. His innovative spirit and collaborative nature continue to inspire advancements in the industry, making him a key figure in the ongoing evolution of semiconductor processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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