Location History:
- Chiba, JP (2005 - 2013)
- Tokyo, JP (1996 - 2019)
Company Filing History:
13 out of 223 
3 out of 223 
2 out of 2,899 
Years Active: 1996-2019
Title: Yutaka Ikku: Innovator in Plasma Technology
Introduction
Yutaka Ikku is a prominent inventor based in Chiba, Japan, known for his significant contributions to the field of plasma technology. With a total of 18 patents to his name, Ikku has made remarkable advancements that enhance the efficiency and effectiveness of inductively coupled plasma devices.
Latest Patents
One of Ikku's latest inventions is the ICP emission spectrophotometer. This device includes an inductively coupled plasma device, a spectroscope, and a computer. The spectroscope is equipped with an incidence window, an incidence side slit, a diffraction grating, an emission window, an emission side slit, and a detector. It displays measurement conditions, including diffraction conditions and measurement results, on a display device. The device allows the measurer to select diffraction conditions with higher resolution and intensity from multiple options.
Another notable patent is the heat transfer system for an inductively coupled plasma device. This system features a plasma torch, a high-frequency induction coil, and a high-frequency power source. A heat transfer member connects the induction coil to a cooling block, improving the cooling capacity by enhancing the circulation and mobility of the operating fluid.
Career Highlights
Ikku has worked with several reputable companies, including Sii Nanotechnology Inc. and Hitachi High-Tech Science Corporation. His experience in these organizations has contributed to his expertise in developing innovative plasma technologies.
Collaborations
Ikku has collaborated with notable coworkers such as Kouji Iwasaki and Yoshiki Matoba, further enriching his work in the field of plasma technology.
Conclusion
Yutaka Ikku's contributions to plasma technology through his patents and collaborations highlight his role as a leading inventor in this specialized field. His innovative solutions continue to advance the capabilities of inductively coupled plasma devices, making a significant impact on the industry.