The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2009
Filed:
Aug. 17, 2007
Applicants:
Junichi Tashiro, Chiba, JP;
Yutaka Ikku, Chiba, JP;
Toshiaki Fujii, Chiba, JP;
Inventors:
Assignee:
SII NanoTechnology Inc., Chiba, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/305 (2006.01); H01J 37/30 (2006.01); G01N 23/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
Detected is a secondary electron generated by irradiating a focused ion beam while performing etching a sample section and the around through scan-irradiating the focused ion beam. From a changing amount of the detected secondary electron signal an end-point detecting mechanism detects an end point to thereby terminate the etching, so that a center position of a defect or a contact hole is effectively detected even with an FIB apparatus not having a SEM observation function.