The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Mar. 20, 2018
Hitachi High-tech Science Corporation, Minato-ku, Tokyo, JP;
Yutaka Ikku, Tokyo, JP;
Hitachi High-Tech Science Corporation, Minato-ku, Tokyo, JP;
Abstract
An ICP emission spectrophotometer includes an inductively coupled plasma device, a spectroscope, and a computer. The spectroscope includes an incidence window, an incidence side slit, a diffraction grating, an emission window, an emission side slit, and a detector. Measurement conditions including diffraction condition and a measurement result are displayed on a display device. In a case where there are a plurality of diffraction conditions each including a combination of a diffraction grating and a diffraction order for measuring desired diffracted light, comparison information including at least an intensity and a resolution of emitted light in the diffraction condition is displayed on the display device. A measurer selects diffraction conditions in which resolution is higher from among the diffraction conditions, and selects a diffraction condition in which an intensity is obtained from among the selected diffraction conditions.