Allen, TX, United States of America

Yuri Solomentsev


Average Co-Inventor Count = 4.9

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2004-2008

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5 patents (USPTO):Explore Patents

Title: Innovations of Yuri Solomentsev

Introduction

Yuri Solomentsev is a notable inventor based in Allen, Texas, recognized for his contributions to semiconductor manufacturing technologies. He holds five patents that showcase his expertise in developing advanced materials and processes for the industry.

Latest Patents

One of his latest patents is titled "CMP metal polishing slurry and process with reduced solids concentration." This invention describes a low particle concentration formulation for slurry, particularly useful in continuous Chemical Mechanical Polishing (CMP) of copper layers during semiconductor wafer manufacture. The slurry is characterized by particle concentrations generally less than 2 wt %, and advantageously less than 1 wt %. In specific embodiments, where the particle concentration is in a range of 50 to 450 PPM, an 8-fold increase in polishing rate over reactive liquid slurries has been realized. The formulated slurries also achieve a reduction in defectivity and variations in planarity from wafer to wafer during manufacture, improving the stability of polishing quality. These formulations permit substantial cost savings over traditional 2-component, reactive liquid and fixed/bonded abrasive slurries. Additionally, they provide an advantageous way during CMP to easily change the selectivity or rate of removal of one film material versus another. Another significant patent is the "Method of using an aqueous solution and composition thereof," which discloses a method for processing semiconductor wafers. In this method, a semiconductor wafer is provided to a processing stage where a block copolymer surfactant (BCS) is applied to the wafer surface. The BCS includes a hydrophobic portion and a hydrophilic portion, and may also be a silicone-containing BCS. The aqueous solution includes abrasive particles and a BCS, with the concentration of the BCS being less than one percent by weight.

Career Highlights

Yuri Solomentsev has worked with Freescale Semiconductor, Inc., where he contributed to the development of innovative semiconductor technologies. His work has significantly impacted the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Yuri has collaborated with notable professionals in the field, including John C. Flake and Yeong-Jyh Tom Lii. These collaborations have further enhanced his contributions to the industry.

Conclusion

Yuri Solomentsev's innovative patents and career achievements highlight his significant role in advancing semiconductor manufacturing technologies. His work continues to influence

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