This inventor holds 5 USPTO granted patents and 3 published patent applications. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2016-2026.
Location History:
- Hsinchu County, TW (2016)
- Zhubei, TW (2023)
Company Filing History:
4 out of 42,810 
1 out of 465 Years Active: 2016-2026
Title: Innovations of Yun-Hua Chen in Semiconductor Technology
Introduction
Yun-Hua Chen is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on improving the efficiency and effectiveness of semiconductor devices.
Latest Patents
Yun-Hua Chen's latest patents include innovative methods for forming transistor source/drain contacts and etching continuous recesses. The first patent describes a method that involves depositing a protective layer on a source/drain region and a gate mask, followed by etching an opening to expose the source/drain region. This process includes depositing metal, annealing it to form a metal-semiconductor alloy, and cleaning the residue while protecting the gate mask. The second patent outlines a method for forming a contact by creating a first and second dielectric layer, patterning them to form recesses, and ultimately forming a continuous contact plug.
Career Highlights
Yun-Hua Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing semiconductor manufacturing techniques and enhancing device performance.
Collaborations
Yun-Hua Chen has collaborated with notable colleagues such as Yi-Chun Huang and Yang-Cheng Wu, contributing to various projects that push the boundaries of semiconductor technology.
Conclusion
Yun-Hua Chen's innovative work in semiconductor technology has led to significant advancements in the field. His patents reflect a commitment to improving manufacturing processes and device efficiency.