Company Filing History:
Years Active: 2012-2015
Title: Innovations of Yu-Lien Liu
Introduction
Yu-Lien Liu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in electrostatic discharge (ESD) protection circuits. With a total of six patents to his name, Liu's work has had a substantial impact on the industry.
Latest Patents
One of Liu's latest patents is an ESD tolerant I/O pad circuit that includes a surrounding well. This electrostatic discharge tolerant device features a semiconductor body with a first conductivity type and a pad. The surrounding well, which has a second conductivity type, is designed in a ring to encircle an area for an electrostatic discharge circuit within the semiconductor body. This well is relatively deep and not only defines the area for the electrostatic discharge circuit but also provides the first terminal of a diode formed with the semiconductor body. Within the area surrounded by the well, a diode coupled to the pad and a transistor connected to the voltage reference are arranged in series, forming a parasitic device in the semiconductor body.
Another notable patent is the electrostatic discharge protection circuit. This circuit includes a substrate of a first conductivity type, an annular well region of a second conductivity type, two first regions of the first conductivity type, and at least one transistor of the second conductivity type. The annular well region is positioned in the substrate, while the first regions are located in the substrate and surrounded by the annular well region. The at least one transistor is situated on the substrate between the first regions and consists of a source, a gate, and a drain. The annular well region and the drain are connected to a first voltage source, while the source and one of the first regions are linked to a second voltage source. The other of the first regions is connected to a substrate triggering circuit.
Career Highlights
Yu-Lien Liu is currently employed at Macronix International Co., Ltd., where he continues to innovate in the field of semiconductor technology. His work has been instrumental in developing advanced ESD protection solutions that enhance the reliability of electronic devices.
Collaborations
Liu has collaborated with notable coworkers, including Shih-Yu Wang and Yan-Yu Chen, who contribute to the innovative environment at Macronix International Co., Ltd. Their combined expertise fosters a culture of creativity and technological advancement.
Conclusion