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For the Inventor, By the Inventor

Tao-Yuan, Taiwan

Yu-Kung Hsiao

USPTO Granted Patents = 19

Average Co-Inventor Count = 4.9

ph-index = 10

Forward Citations = 317(Granted Patents)


Location History:

  • Tao-Yuan County, TW (2001)
  • Tau-Yuan, TW (2003)
  • Tan-Yuan, TW (2003)
  • Tao-Yuan, TW (2002 - 2006)
  • Yangmei, TW (2008)
  • Yang Mei Town, TW (2009 - 2012)

Company Filing History:

goldMedal19 out of 40,850 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2001-2012

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19 patents (USPTO):Explore Patents
1. 8129762 - Image sensor (2012-03-06),
2. 7507598 - Image sensor fabrication method and structure (2009-03-24),
3. 7372497 - Effective method to improve sub-micron color filter sensitivity (2008-05-13),
4. 7071032 - Material to improve image sensor yield during wafer sawing (2006-07-04),
5. 7009772 - High transmittance overcoat for microlens arrays in semiconductor color imagers (2006-03-07),
6. 6956253 - Color filter with resist material in scribe lines (2005-10-18),
7. 6878642 - Method to improve passivation openings by reflow of photoresist to eliminate tape residue (2005-04-12),
8. 6849533 - Method for fabricating microelectronic product with attenuated bond pad corrosion (2005-02-01),
9. 6821810 - High transmittance overcoat for optimization of long focal length microlens arrays in semiconductor color imagers (2004-11-23),
10. 6759276 - Material to improve CMOS image sensor yield during wafer sawing (2004-07-06),
11. 6660641 - Method for forming crack resistant planarizing layer within microelectronic fabrication (2003-12-09),
12. 6623912 - Method to form the ring shape contact to cathode on wafer edge for electroplating in the bump process when using the negative type dry film photoresist (2003-09-23),
13. 6590239 - Color filter image array optoelectronic microelectronic fabrication with a planarizing layer formed upon a concave surfaced color filter region (2003-07-08),
14. 6582988 - Method for forming micro lens structures (2003-06-24),
15. 6531266 - Rework procedure for the microlens element of a CMOS image sensor (2003-03-11),

Title: **The Innovative Journey of Yu-Kung Hsiao**

Introduction

Yu-Kung Hsiao is a prominent inventor based in Tao-Yuan, Taiwan, known for his significant contributions to the field of image sensor technologies. With a remarkable portfolio of 19 patents, Hsiao exemplifies the spirit of innovation in electronics and semiconductor manufacturing. His work is instrumental in advancing the quality and efficiency of image sensors used in various applications.

Latest Patents

Among his latest inventions, Hsiao has developed a method for processing a substrate that includes at least one filter region, multiple bond pads, and several scribe lines. This method is designed to ensure that a first planarization layer is formed above the substrate, featuring a substantially flat top surface that overlays the filter region, bond pads, and scribe lines. Additionally, at least one color resist layer is applied over the first planarization layer within the filter region while maintaining coverage over the bond pads and scribe lines. This innovation not only enhances the image sensor fabrication process but also contributes to the overall reliability of the products.

Career Highlights

Hsiao's career is marked by his dedication to enhancing semiconductor technologies, particularly in his role at Taiwan Semiconductor Manufacturing Company Ltd. His leadership in research and development has led to significant breakthroughs in image sensor technology, reflecting his commitment to pushing the boundaries of innovation in this competitive field.

Collaborations

Throughout his career, Yu-Kung Hsiao has collaborated with talented professionals such as Sheng-Liang Pan and Chih-Kung Chang. These partnerships have fostered a collaborative environment that encourages the sharing of ideas and the pursuit of groundbreaking inventions within the realm of semiconductor manufacturing.

Conclusion

Yu-Kung Hsiao stands out as a trailblazer in the image sensor industry, with a proven track record of innovation and collaboration. His contributions not only exemplify the essence of cutting-edge technology but also inspire future generations of inventors and researchers seeking to create impactful solutions in the world of electronics. Hsiao's journey continues to be watched closely by those invested in technological advancements and the future of image sensing technologies.

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