Yu-Jiun Peng

Title: Innovations of Yu-Jiun Peng in Semiconductor Technology

Introduction

Yu-Jiun Peng is a notable inventor based in Taichung, Taiwan, recognized for his contributions to semiconductor technology. With a total of 5 patents, he has made significant advancements in the field, particularly in gate formation methods for semiconductor devices.

Latest Patents

Among his latest patents, one method involves forming an active region on a substrate and creating a sacrificial gate stack that engages with the active region. This process includes measuring the gate length of the sacrificial gate stack at a height lower than the top surface of the active region. Based on this measurement, an etching recipe is selected, and the sacrificial gate stack is etched to form a gate trench, followed by the formation of a metal gate stack within that trench. Another patent focuses on controlling gate formation by acquiring a correlation between gate critical dimensions and etching recipes. This method includes measuring a gate critical dimension on a target wafer and determining an etching recipe based on the correlation and the measured dimension, ultimately performing an etching process to create a gate trench.

Career Highlights

Yu-Jiun Peng has worked with prominent organizations such as Taiwan Semiconductor Manufacturing Company Ltd. and National Taiwan University. His experience in these institutions has allowed him to refine his expertise in semiconductor technologies and contribute to innovative solutions in the industry.

Collaborations

Some of his notable coworkers include Chang-Jhih Syu and Chih-Hao Yu, who have collaborated with him on various projects, enhancing the research and development efforts in semiconductor technology.

Conclusion

Yu-Jiun Peng's work in semiconductor technology exemplifies the innovative spirit of modern inventors. His patents and collaborations reflect a commitment to advancing the field and improving semiconductor device manufacturing processes.