Yu-Chyi Harn is a prominent inventor based in Bao-Shan, Taiwan. He has made significant contributions to the field of integrated circuit design, holding a total of 5 patents. His work focuses on enhancing the efficiency and effectiveness of integrated circuit technologies.

Latest Patents

Yu-Chyi Harn's latest patents include innovative methods and devices for pattern alignment in integrated circuits. One notable patent is a structure for integrated circuit alignment, which discloses a device that includes an exposure field, a die with an integrated circuit region, a seal ring region, and a corner stress relief region. Additionally, he has developed a method and system for predicting shrinkable yield for business assessment of integrated circuit design shrink. This system provides a cost-benefit analysis across different design shrink technologies, enabling early business decisions regarding design shrinks.

Career Highlights

Yu-Chyi Harn is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in integrated circuit design has positioned him as a valuable asset to the company.

Collaborations

Throughout his career, Yu-Chyi Harn has collaborated with notable colleagues, including Chung-Min Fu and Hsien-Wei Chen. These collaborations have furthered advancements in integrated circuit technologies.

Conclusion

Yu-Chyi Harn's contributions to integrated circuit design and his innovative patents reflect his dedication to advancing technology in the semiconductor industry. His work continues to influence the field and drive progress in integrated circuit applications.

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