The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
Nov. 16, 2009
Applicants:
Yu-chyi Harn, Bao-Shan, TW;
Sophia Wang, Xin-Zhu, TW;
Chun-hung Lin, Taoyuan, TW;
Hsien-wei Chen, Sinying, TW;
Ming-yen Chiu, Hsinchu, TW;
Inventors:
Yu-Chyi Harn, Bao-Shan, TW;
Sophia Wang, Xin-Zhu, TW;
Chun-Hung Lin, Taoyuan, TW;
Hsien-Wei Chen, Sinying, TW;
Ming-Yen Chiu, Hsinchu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and device for pattern alignment are disclosed. The device can include an exposure field; a die within the exposure field, wherein the die comprises an integrated circuit region, a seal ring region, and a corner stress relief region; and a die alignment mark disposed between the seal ring region and the corner stress relief region.