The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2014

Filed:

Nov. 16, 2009
Applicants:

Yu-chyi Harn, Bao-Shan, TW;

Sophia Wang, Xin-Zhu, TW;

Chun-hung Lin, Taoyuan, TW;

Hsien-wei Chen, Sinying, TW;

Ming-yen Chiu, Hsinchu, TW;

Inventors:

Yu-Chyi Harn, Bao-Shan, TW;

Sophia Wang, Xin-Zhu, TW;

Chun-Hung Lin, Taoyuan, TW;

Hsien-Wei Chen, Sinying, TW;

Ming-Yen Chiu, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and device for pattern alignment are disclosed. The device can include an exposure field; a die within the exposure field, wherein the die comprises an integrated circuit region, a seal ring region, and a corner stress relief region; and a die alignment mark disposed between the seal ring region and the corner stress relief region.


Find Patent Forward Citations

Harn, Yu-Chyi. (2014). Structure for integrated circuit alignment (U.S. Patent No. 8786054). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8786054

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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