Company Filing History:

5 out of 14,705

Infineon Technologies Ag

patents

1 out of 164,108

International Business Machines Corporation

patents

1 out of 30,028

Siemens Aktiengesellschaft

patents

4. 1 out of 244

Infineon Technologies North America Corp.

patents

5. 4 out of 832,680

Other

patents

Years Active: 2000-2006

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 7153781 - Method to etch poly Si gate stacks with raised STI structure (2006-12-26),

2. 6992394 - Multi-level conductive lines with reduced pitch (2006-01-31),

3. 6593613 - Memory cell for plateline sensing (2003-07-15),

4. 6469392 - Conductive lines with reduced pitch (2002-10-22),

5. 6396096 - Design layout for a dense memory cell structure (2002-05-28),

6. 6362033 - Self-aligned LDD formation with one-step implantation for transistor formation (2002-03-26),

7. 6284666 - Method of reducing RIE lag for deep trench silicon etching (2001-09-04),

8. 6261924 - Maskless process for self-aligned contacts (2001-07-17),

9. 6214661 - Method to prevent oxygen out-diffusion from BSTO containing micro-electronic device (2001-04-10),

10. 6211544 - Memory cell layout for reduced interaction between storage nodes and transistors (2001-04-03),

11. 6201730 - Sensing of memory cell via a plateline (2001-03-13),

12. 6137178 - Semiconductor metalization system and method (2000-10-24),

Title: Innovations of Young-Jin Park

Introduction

Young-Jin Park is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of technology, particularly in semiconductor manufacturing. With a total of 12 patents to his name, Park has demonstrated a strong commitment to innovation and advancement in his field.

Latest Patents

Among his latest patents is a method to etch poly Si gate stacks with raised STI structure. This process addresses the challenge of differing thicknesses of poly Si gates at the AA and STI. Another notable invention is the development of multi-level conductive lines with reduced pitch. This invention describes the use of conductive lines with a non-rectangular shaped cross-section to minimize line capacitance for a given pitch. Such advancements can lead to reduced height in integrated circuits without increasing line-to-line capacitance.

Career Highlights

Throughout his career, Young-Jin Park has worked with prominent companies, including Infineon Technologies AG. His work has significantly impacted the semiconductor industry, showcasing his expertise and innovative spirit.

Collaborations

Park has collaborated with notable professionals in his field, including Heon Lee and Gerhard Mueller. These collaborations have further enriched his contributions to technology and innovation.

Conclusion

Young-Jin Park's work exemplifies the spirit of innovation in the semiconductor industry. His patents and collaborations highlight his dedication to advancing technology and improving manufacturing processes.

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