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For the Inventor, By the Inventor

Toyama, Japan

Yosuke Ota

USPTO Granted Patents = 27 


Average Co-Inventor Count = 2.6

ph-index = 5

Forward Citations = 1,001(Granted Patents)


Location History:

  • Oume, JP (2015)
  • Toyama, JP (2011 - 2018)
  • Chiba, JP (2012 - 2021)
  • Ome, JP (2015 - 2021)

Company Filing History:

goldMedal20 out of 1,257 
 
Hitachi-kokusai Electric Inc.
 patents
silverMedal7 out of 895 
 
Sumitomo Metal Mining Company, Ltd.
 patents

Years Active: 2011-2021

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27 patents (USPTO):
1. 11196049 - Coated lithium-nickel composite oxide particles, and method for producing coated lithium-nickel composite oxide particles (2021-12-07),
2. 11031585 - Method for producing coated nickel-based lithium-nickel composite oxide particles (2021-06-08),
3. 10749182 - Coated lithium-nickel composite oxide particles and method for producing coated lithium-nickel composite oxide particles (2020-08-18),
4. 10553860 - Covered lithium-nickel composite oxide particles, and method for manufacturing covered lithium-nickel composite oxide particles (2020-02-04),
5. 10439214 - Coated lithium-nickel composite oxide particles and method for producing coated lithium-nickel composite oxide particles (2019-10-08),
6. 10374226 - Coated lithium-nickel composite oxide particles, and method for producing coated lithium-nickel composite oxide particles (2019-08-06),
7. 9966252 - Method of manufacturing semiconductor device and substrate processing apparatus (2018-05-08),
8. 9966251 - Method of manufacturing semiconductor device and substrate processing apparatus (2018-05-08),
9. 9761437 - Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus (2017-09-12),
10. 9334567 - Method for manufacturing semiconductor device, method for processing substrate and substrate processing apparatus (2016-05-10),
11. 9269566 - Substrate processing apparatus (2016-02-23),
12. 9217199 - Substrate processing apparatus (2015-12-22),
13. 9196473 - Method of manufacturing an oxynitride film for a semiconductor device (2015-11-24),
14. 9123530 - Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus (2015-09-01),
15. 9039838 - Method of manufacturing semiconductor device and substrate processing apparatus (2015-05-26),

Title: Yosuke Ota: Pioneering Inventor from Toyama, JP

Introduction: Yosuke Ota is a renowned inventor hailing from Toyama, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Yosuke Ota holds several patents in the areas of robotics, artificial intelligence, and renewable energy, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Yosuke Ota has worked with leading tech companies in Japan, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Yosuke Ota has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge sharing.

Conclusion: Yosuke Ota's passion for innovation and his relentless drive to push the boundaries of what is possible make him a true trailblazer in the world of inventions.

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