The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2015

Filed:

Mar. 07, 2012
Applicants:

Yosuke Ota, Ome, JP;

Yoshiro Hirose, Toyama, JP;

Inventors:

Yosuke Ota, Ome, JP;

Yoshiro Hirose, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/36 (2006.01); C23C 16/455 (2006.01); B05C 11/00 (2006.01); H01L 21/314 (2006.01); H01L 21/31 (2006.01); H01L 21/02 (2006.01); C23C 16/30 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02118 (2013.01); C23C 16/30 (2013.01); C23C 16/401 (2013.01); C23C 16/45523 (2013.01); C23C 16/45525 (2013.01); C23C 16/45546 (2013.01); H01L 21/0228 (2013.01); H01L 21/02126 (2013.01); H01L 21/02164 (2013.01); H01L 21/02211 (2013.01); H01L 21/02219 (2013.01); H01L 21/02271 (2013.01);
Abstract

Provided are: forming an oxycarbonitride film, an oxycarbide film or an oxide film on a substrate by alternately performing a specific number of times: forming a first layer containing the specific element, nitrogen and carbon, on the substrate, by alternately performing a specific number of times, supplying a first source containing the specific element and a halogen-group to the substrate in a processing chamber, and supplying a second source containing the specific element and an amino-group to the substrate in the processing chamber; and forming a second layer by oxidizing the first layer by supplying an oxygen-containing gas, and an oxygen-containing gas and a hydrogen-containing gas to the substrate in the processing chamber.


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