Inventors with similar research interests:
Location History:
- Ishikawa-ken, JP (2015)
- Saitama, JP (2014 - 2016)
- Ishikawa, JP (2015 - 2016)
- Tokyo, JP (2008 - 2018)
- Musashino, JP (2018 - 2019)
- Nonoichi Ishikawa, JP (2021 - 2023)
Company Filing History:
Years Active: 2008-2023
Title: **Yoshiyuki Harada: Innovator in Semiconductor Technology**
Introduction
Yoshiyuki Harada is a distinguished inventor based in Tokyo, Japan, holding an impressive portfolio of 51 patents. His contributions to the field of semiconductor technology have played a pivotal role in the advancement of electronic devices.
Latest Patents
One of his notable recent inventions is a semiconductor device and method for manufacturing the same. This invention features an n-type semiconductor layer, with a layered structure that includes a first metal layer containing atoms capable of serving as n-type impurities, a second metal layer incorporating titanium atoms, and a third metal layer. Additionally, the device integrates a second atom that can act as a p-type impurity, strategically positioned near the interface between the first and second metal layers to enhance functionality.
Career Highlights
Throughout his career, Yoshiyuki Harada has made significant strides in the technology sector by working with renowned companies such as Kabushiki Kaisha Toshiba and Konica Minolta, Inc. His work at these institutions has established him as a key player in semiconductor innovations.
Collaborations
Harada has had the pleasure of collaborating with talented professionals such as Shinya Nunoue and Toshiki Hikosaka. These partnerships have further fueled his inventive pursuits and contributed to the development of cutting-edge technologies.
Conclusion
Yoshiyuki Harada's dedication to semiconductor innovation is evident in his extensive patent portfolio and collaborative efforts. His work continues to influence the electronics industry, paving the way for future advancements in semiconductor technology.
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