Location History:
- Sagamihara, JP (2014)
- Kanagawa, JP (2009 - 2015)
- Kawasaki, JP (2016)
- Hitachinaka, JP (2019)
- Tokyo, JP (2001 - 2020)
Company Filing History:
7 out of 7,529 
4 out of 35,734 
2 out of 2,467 
Years Active: 2001-2020
Title: Innovations of Yoshitake Kato
Introduction
Yoshitake Kato is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.
Latest Patents
One of his latest patents is a semiconductor device that includes a plurality of nitride semiconductor layers. This invention involves a semiconductor device (MISFET) with a gate electrode formed over a nitride semiconductor layer, where a gate insulating film is interposed. The gate insulating film consists of a first gate insulating film made of an oxide film of a first metal and a second gate insulating film made of an oxide film of a second metal. The second metal, such as Hafnium (Hf), has lower electronegativity than the first metal, like Aluminum (Al). This configuration allows for the introduction of negative charge into the oxide film of the first metal, shifting the flat-band voltage positively.
Another notable patent by Kato is focused on enhancing the characteristics of a semiconductor device. In this invention, the gate insulating film is designed with a first gate insulating film formed on the nitride semiconductor layer and a second gate insulating film. The second metal used in this configuration also has lower electronegativity than the first metal, allowing for a positive shift in the threshold voltage. This design prevents the diffusion of oxygen to the gate insulating film, thereby reducing variations in the threshold voltage.
Career Highlights
Yoshitake Kato has worked with notable companies in the semiconductor industry, including Renesas Electronics Corporation and NEC Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Kato has collaborated with several professionals in his field, including Misato Sakamoto and Youichi Yamamoto. These collaborations have likely enriched his work and led to further advancements in semiconductor technology.
Conclusion
Yoshitake Kato's contributions to semiconductor technology through his innovative patents demonstrate his significant impact on the industry. His work continues to influence the development of more efficient semiconductor devices.