San Jose, CA, United States of America

Yoshitaka Yokota

This inventor holds 22 USPTO granted patents and 2 published patent applications and 2 EPO patents, primarily in Semiconductor Processing. Top assignee: Applied Materials, Inc.. Active years: 2004-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshitaka Yokota. Retrieved from https://idiyas.com/inventor/yoshitaka-yokota

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 59.1

 

Average Co-Inventor Count = 4.1

ph-index = 7

Forward Citations = 615(Granted Patents)


Company Filing History:


Years Active: 2004-2016

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Areas of Expertise:
Semiconductor Devices
Oxide Layers
Nitridation
Thermal Reactor
Gas Flow Distribution
Selective Oxidation
Low Pressure CVD
Conformal Oxide Layers
Plasma Treatment
Silicon Processing
Ozone Oxidation
UV Assisted Processing
22 patents (USPTO):Explore Patents

Title: Innovations in Semiconductor Technology by Yoshitaka Yokota

Introduction

Yoshitaka Yokota, located in San Jose, CA, has made significant contributions to the field of semiconductor technology with a notable portfolio of 22 patents. His work focuses on innovative methods of fabrication for semiconductor devices, particularly in the realm of narrow pitch applications, which are essential for advancing electronic components.

Latest Patents

Yokota's latest patents highlight groundbreaking developments in semiconductor devices. One noteworthy patent describes semiconductor devices suitable for narrow pitch applications and methods of fabrication therefor. In this invention, a semiconductor device includes a floating gate engineered with varying widths to enhance its performance. The method includes a meticulous process of oxidizing a material layer to form an oxide layer, followed by specific etching procedures to achieve the desired shape for the floating gate.

Additionally, he has developed methods and apparatus for post-treating oxide layers on semiconductor substrates. This technique employs a helium-containing plasma to improve the interface between silicon substrates and oxide layers, ensuring better performance and durability of semiconductor devices.

Career Highlights

Yoshitaka Yokota currently works at Applied Materials, Inc., a leader in materials engineering solutions. His innovations have played a crucial role in enhancing semiconductor device efficiency and reliability, contributing to the advancement of technology within the industry.

Collaborations

Throughout his career, Yokota has collaborated with esteemed colleagues, including Christopher Sean Olsen and Norman L. Tam. These partnerships have fostered an environment of innovation and creativity, enabling the development of advanced semiconductor technologies.

Conclusion

Yoshitaka Yokota stands out as a prominent figure in the semiconductor industry, with a focus on innovative fabrication methods that address the challenges posed by modern electronic devices. His contributions through patents not only exemplify his ingenuity but also reflect the collaborative spirit of the field, ensuring continuous advancements in technology and materials engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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