The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2013
Filed:
Jan. 22, 2010
Agus S. Tjandra, San Jose, CA (US);
Christopher S. Olsen, Fremont, CA (US);
Johanes F. Swenberg, Los Gatos, CA (US);
Yoshitaka Yokota, San Jose, CA (US);
Agus S. Tjandra, San Jose, CA (US);
Christopher S. Olsen, Fremont, CA (US);
Johanes F. Swenberg, Los Gatos, CA (US);
Yoshitaka Yokota, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus for forming an oxide layer on a semiconductor substrate are disclosed. In one or more embodiments, plasma oxidation is used to form a conformal oxide layer by controlling the temperature of the semiconductor substrate at below about 100° C. Methods for controlling the temperature of the semiconductor substrate according to one or more embodiments include utilizing an electrostatic chuck and a coolant and gas convection.