The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Apr. 19, 2010
Kai MA, Palo Alto, CA (US);
Christopher S. Olsen, Fremont, CA (US);
Yoshitaka Yokota, San Jose, CA (US);
Kai Ma, Palo Alto, CA (US);
Christopher S. Olsen, Fremont, CA (US);
Yoshitaka Yokota, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus for post treating an oxide layer on a semiconductor substrate are disclosed. In one or more embodiments, the oxide layer is formed by thermal oxidation or plasma oxidation and treated with a plasma comprising helium. The helium-containing plasma may also include hydrogen, neon, argon and combinations thereof. In one or more embodiments, a SiOoxide layer is formed on a silicon substrate and treated with a plasma to improve the interface between the silicon substrate and the SiOoxide layer.