Yokohama, Japan

Yoshimasa Ooshima

USPTO Granted Patents = 9 

Average Co-Inventor Count = 6.2

ph-index = 4

Forward Citations = 87(Granted Patents)


Location History:

  • Tokyo, JP (2004 - 2007)
  • Yokohama, JP (2007 - 2011)

Company Filing History:


Years Active: 2004-2011

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9 patents (USPTO):

Title: Innovations of Yoshimasa Ooshima

Introduction

Yoshimasa Ooshima is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor device inspection, holding a total of nine patents. His work focuses on improving the efficiency and accuracy of particle and defect detection in manufacturing processes.

Latest Patents

One of his latest patents is a method and apparatus for inspecting particles or defects of a semiconductor device. This invention addresses the challenges faced by conventional inspection apparatuses, which typically output a total number of detected particles or defects. Ooshima's invention allows for a more detailed analysis of these particles and defects, linking their sizes to potential causes of failure. This innovation significantly reduces the time required for failure analysis, enabling quicker countermeasures in manufacturing processes. Another notable patent is an apparatus and method for inspecting defects, which includes a classification unit that utilizes signals from high-angle and low-angle illumination optical systems. This system estimates defect sizes based on a concave-convex level, enhancing the accuracy of defect classification.

Career Highlights

Yoshimasa Ooshima has worked with notable companies such as Hitachi, Ltd. and Hitachi High-Technologies Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Throughout his career, Ooshima has collaborated with talented individuals, including Minori Noguchi and Hidetoshi Nishiyama. These partnerships have contributed to the advancement of his inventions and the overall progress in the field of semiconductor inspection.

Conclusion

Yoshimasa Ooshima's contributions to semiconductor device inspection through his innovative patents have significantly impacted the industry. His work continues to pave the way for advancements in manufacturing processes and defect analysis.

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