The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2007
Filed:
Jan. 18, 2002
Akira Hamamatsu, Yokohama, JP;
Minori Noguchi, Mitsukaido, JP;
Yoshimasa Ooshima, Yokohama, JP;
Hidetoshi Nishiyama, Fujisawa, JP;
Tetsuya Watanabe, Honjyou, JP;
Akira Hamamatsu, Yokohama, JP;
Minori Noguchi, Mitsukaido, JP;
Yoshimasa Ooshima, Yokohama, JP;
Hidetoshi Nishiyama, Fujisawa, JP;
Tetsuya Watanabe, Honjyou, JP;
Hitachi, Ltd., Tokyo, JP;
Hitachi High-Electronics Corporation, Tokyo, JP;
Abstract
The present invention is characterized by the following: incident illumination and oblique illumination are performed on a scratch and a foreign material, which have been made on a surface of a polished or a ground insulating layer, with substantially the same luminous flux; and on the basis of a correlation such as a ratio of intensity of scattered light generated by the shallow scratch and the foreign material between the incident illumination and the oblique illumination, the shallow scratch is discriminated from the foreign material.