Izu, Japan

Yoshikazu Moriyama

USPTO Granted Patents = 11 

Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 24(Granted Patents)


Location History:

  • Shizuoka, JP (2011 - 2018)
  • Izu, JP (2011 - 2024)

Company Filing History:


Years Active: 2011-2025

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11 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Yoshikazu Moriyama

Introduction

Yoshikazu Moriyama is a prominent inventor based in Izu, Japan. He has made significant contributions to the field of technology, particularly in the area of film deposition methods. With a total of 11 patents to his name, Moriyama's work has had a substantial impact on the industry.

Latest Patents

One of Moriyama's latest patents is a film deposition method that involves rotating a wafer mounted on a susceptor within a reaction chamber. This method controls the temperature of the wafer, ensuring that when the rotational speed of the wafer changes before and after the film deposition step, the friction force on the contact surface between the wafer and the susceptor exceeds the inertia force in the direction of rotation. Another notable patent is related to the susceptor ring, which plays a crucial role in the film deposition process.

Career Highlights

Moriyama is currently employed at Nuflare Technology, Inc., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of film deposition techniques, which are essential in various applications, including semiconductor manufacturing.

Collaborations

Throughout his career, Moriyama has collaborated with several talented individuals, including Hironobu Hirata and Kunihiko Suzuki. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Yoshikazu Moriyama's contributions to the field of technology through his innovative patents and collaborative efforts highlight his importance as an inventor. His work continues to influence the industry and pave the way for future advancements.

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