Itami, Japan

Yoshiaki Hagi


Average Co-Inventor Count = 2.3

ph-index = 3

Forward Citations = 26(Granted Patents)


Location History:

  • Hyogo, JP (1997 - 1998)
  • Itami, JP (2001 - 2020)
  • Kobe, JP (2022)

Company Filing History:


Years Active: 1997-2022

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11 patents (USPTO):

Title: Yoshiaki Hagi: Pioneering Innovations in Crystal Substrates

Introduction

Yoshiaki Hagi, an accomplished inventor based in Itami, Japan, has made significant contributions to the field of crystal substrate technology. With a remarkable portfolio of 11 patents, Hagi has focused on developing advanced materials that play a crucial role in modern electronics and optoelectronics.

Latest Patents

Among his latest patents, Hagi has developed two notable crystal substrates: the indium phosphide crystal substrate and the gallium nitride crystal substrate.

The indium phosphide crystal substrate measures between 100-205 mm in diameter and has a thickness of 300-800 μm. It features both a flat portion and a notch portion. Depending on the atomic concentration of sulfur, tin, and iron, the average dislocation density can vary significantly. For instance, with a sulfur concentration ranging from 2.0×10^8 to 8.0×10^10 cm, the substrate exhibits an average dislocation density of 10-500 cm. Conversely, when the atomic concentration of tin or iron is within specified ranges, the dislocation density can reach up to 5000 cm.

The gallium nitride crystal substrate boasts a diameter of 50-155 mm, also with a thickness of 300-800 μm, and incorporates flat and notch portions at the outer edge. This substrate contains oxygen and silicon atoms, along with carriers at a concentration of 2×10^10 to 4×10^10 cm, yielding an average dislocation density between 1000 to 5×10^5 cm within designated regions.

Career Highlights

Yoshiaki Hagi's career is marked by his association with Sumitomo Electric Industries, Limited, a leading company in the field of electrical and electronic components. His innovative work has advanced the understanding and application of crystal substrates in various technologies.

Collaborations

Throughout his career, Hagi has collaborated with esteemed colleagues, including Takashi Sakurada and Tomohiro Kawase. These partnerships have fostered a collaborative environment that encourages creativity and the development of groundbreaking technologies.

Conclusion

Yoshiaki Hagi's contributions to the field of crystal substrate technology reflect his dedication to innovation and excellence. With a growing list of patents and successful collaborations, he continues to drive advancements in material science, contributing to the future of electronic and optoelectronic applications.

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