Yoichiro Numasawa

Title: The Innovative Contributions of Yoichiro Numasawa

Introduction

Yoichiro Numasawa is a prominent inventor based in Machida, Japan. He has made significant contributions to the field of photoelectric conversion devices and plasma treatment systems. With a total of 12 patents to his name, Numasawa's work has had a considerable impact on technology and innovation.

Latest Patents

One of Numasawa's latest patents is a photoelectric conversion device designed to minimize resistance loss while maximizing conversion efficiency. This device features a first silicon semiconductor layer and a second silicon semiconductor layer positioned between a pair of electrodes. The first layer is placed over one surface of a crystalline silicon substrate, which has a conductivity type opposite to that of the substrate. The second layer is located on the opposite surface and shares the same conductivity type as the substrate. Notably, both layers exhibit a carrier concentration that varies in the film thickness direction.

Another significant patent involves a plasma treatment system and its cleaning method. This apparatus includes a reaction vessel equipped with a top and bottom electrode. The top electrode receives VHF band high-frequency power, while the bottom electrode supports a substrate that can be moved vertically. The system is controlled to narrow the gap between the electrodes during the cleaning process, allowing for the formation of a narrow space where high-density plasma is utilized. This innovative approach enhances the efficiency of cleaning gas usage, reduces exhaust gas output, and accelerates the cleaning speed, ultimately lowering process costs.

Career Highlights

Throughout his career, Numasawa has worked with notable companies such as Anelva Corporation and Canon Anelva Corporation. His experience in these organizations has contributed to his expertise in developing advanced technologies in the semiconductor and plasma treatment fields.

Collaborations

Numasawa has collaborated with esteemed colleagues, including Nobuyuki Takahashi and Shinya Hasegawa. These partnerships have fostered innovation and the exchange of ideas, further enhancing the impact of their collective work.

Conclusion

Yoichiro Numasawa's contributions to the fields of photoelectric conversion and plasma treatment systems exemplify his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving efficiency and reducing costs in these critical areas. Numasawa's work continues to influence the industry and inspire future innovations.