Location History:
- Shinsuku-ku, Tokyo, JP (1991)
- Shinjuku-ku, Tokyo, JP (1993 - 1995)
- Tokyo, JP (1987 - 1998)
Company Filing History:
3 out of 6 
2 out of 35,756 
2 out of 1,868 
Years Active: 1987-1998
Title: Inventor Yoichi Murayama: Pioneering Innovations in Thin Film Technology
Introduction
Yoichi Murayama is a notable inventor based in Tokyo, Japan, with a remarkable portfolio of 9 patents. His contributions to the field of thin film technology have made significant strides in various applications, particularly in color display technologies and vapor deposition processes.
Latest Patents
Among his latest inventions is the "Method for Producing a Thin Film Resin Matrix." This innovative technique offers a high-performance black matrix that can replace the traditional chromium film black matrix. The method involves vaporizing one or more organic pigments or a metal alloy alongside these pigments, followed by forming a thin film or mixed composite thin film onto a substrate through plasma exciting deposition. Another groundbreaking invention is the "Plasma Vapor Deposition Apparatus," designed to form high-quality films of Indium Tin Oxide (ITO) with remarkable productivity. This apparatus features a vapor deposition chamber, a drive with a horizontally rotating circular holding plate, and a unique film thickness correcting plate. This setup ensures that excess excited vapor particles do not accumulate on the substrate’s surface, creating a more uniform film.
Career Highlights
Throughout his career, Yoichi Murayama has collaborated with prominent companies, including C. Itoh Fine Chemical Co., Ltd. His work has pushed the boundaries of thin film technologies, making him a respected figure in the industry.
Collaborations
Murayama's innovative journey has also seen him working alongside colleagues Kunihiro Kashiwagi and Yasuhiko Yoshida. Their collective expertise has further enhanced the quality and impact of Murayama’s inventions, facilitating advancements in thin film applications.
Conclusion
Yoichi Murayama's contributions encapsulate the essence of innovation in the realm of thin film technology. With his extensive patent portfolio and impactful collaborations, he continues to be a driving force in revolutionizing materials used in various modern applications. His work not only demonstrates technical proficiency but also highlights the importance of collaboration in driving technological advancements.