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Forward Citations = 105

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12 inventors (with patents filed for the assignee):

Yoichi Murayama (3 out of 9 patents)

Hiroshi Uchiyama (2 out of 10 patents)

Yasuhiko Yoshida (2 out of 3 patents)

4. Yasuo Sawada (1 out of 13 patents)

5. Masuhiro Kogoma (1 out of 20 patents)

6. Atsushi Nishiwaki (1 out of 3 patents)

7. Satiko Okazaki (1 out of 16 patents)

8. Kunihiro Kashiwagi (1 out of 1 patent)

9. Toshio Narita (1 out of 1 patent)

10. Kazumi Ogino (1 out of 1 patent)

11. Hideo Inagaki (1 out of 1 patent)

12. Norihito Ikemiya (1 out of 1 patent)

6 patents: Sort by Forward Citations

1. 5853817 - Method for producing a thin film resin matrix (1998-12-29),

2. 5474611 - Plasma vapor deposition apparatus (1995-12-12),

3. 5384167 - Method for the surface treatment of a metal by atmospheric pressure (1995-01-24),

4. 5346728 - Method for reforming surface (1994-09-13),

5. 5258886 - Thin film capacitor and apparatus for manufacturing same (1993-11-02),

6. 5124173 - Atmospheric pressure plasma surface treatment process (1992-06-23),

C. Itoh Fine Chemical Co., Ltd. is a leading chemical manufacturer specializing in the production of high-quality fine chemicals. With a strong focus on research and development, the company consistently delivers innovative solutions to meet the various needs of its customers. Their products are widely used in industries such as pharmaceuticals, cosmetics, and specialty chemicals.

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Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

6 Patents

#2,212 in Tokyo

#5,843 in Japan

Tokyo, Japan

C. Itoh Fine Chemical Co., Ltd.